Femtosecond laser fabrication of high reflectivity micromirrors
- Author(s)
- Daniel Brodoceanu, Garrett Cole, Nikolai Kiesel, Markus Aspelmeyer, Dieter Bäuerle
- Abstract
High-quality freestanding micromirrors consisting of 40 dielectric layers on silicon have been fabricated by ultrashort-pulse laser ablation in combination with laser-assisted wet chemical etching. Backside material removal enables direct access to both faces of the dielectric coating. The amplitude reflectance of the micromirrors has been determined by Fabry-Peacuterot interferometry; a finesse in excess of 8900 +/- 700, corresponding to a reflectivity exceeding 99.95%, has been found. The mechanical quality factor, Q, of the microresonators, measured at 20 K, is determined to be between 5000 and 6000.
- Organisation(s)
- Quantum Optics, Quantum Nanophysics and Quantum Information
- External organisation(s)
- Johannes Kepler Universität Linz
- Journal
- Applied Physics Letters
- Volume
- 97
- No. of pages
- 3
- ISSN
- 0003-6951
- DOI
- https://doi.org/10.1063/1.3467846
- Publication date
- 2010
- Peer reviewed
- Yes
- Austrian Fields of Science 2012
- 103026 Quantum optics, 210006 Nanotechnology, 103025 Quantum mechanics, 203017 Micromechanics
- Portal url
- https://ucris.univie.ac.at/portal/en/publications/femtosecond-laser-fabrication-of-high-reflectivity-micromirrors(ba756e13-0579-4d49-a108-ade45deb9fd8).html